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--- vapor_silanation_rig [2023/01/05 02:02] – [Trimethylchlorosilane] haley
+++ vapor_silanation_rig [2023/06/26 22:28] (current) – furst
@@ Line 1: / Line 1: @@
-====== Vapor Silanation Rig ======
+====== Vapor Silanization Rig ======
-^                               PRIMO                                   ^
+^                               Vapor Silanization Rig                                   ^
 |            {{:tools:vaporsilanationrig:img_5307.jpg?200|}}                   |
-| **Tool Type:**                  "Vacuum deposition chamber"                           |
+| **Tool Type:**                  Surface treatment                          |
-| **Location:**                   "Microfluidics Lab"                           |
+| **Location:**                   Microfluidics Lab                           |
-|  **Supervisor**        |  **Tool Lead**  |
+| **Description:**                Vacuum deposition chamber                           |
-|  David Bothman         |  "WW Name"  |
+| **Manufacturer:**               Fisher Scientific                           |
-|  (805) 893-4125        |  (###) ###-####  |
-|  bothman@cnsi.ucsb.edu  |  "WW Email"  |
-| **Description:**                "Vapor Silanation Rig"                           |
+Last Updated: 4/4/23 Haley
-| **Manufacturer:**               "TEXT HERE"                           |
-Last Updated: 7/6/22 Haley
 ----
 ===== About =====
-The vapor silanation rig is located in the first fume hood you see to your left when you walk in the door of the microfluidics lab, Elings 3430.
+The vapor silanization rig is located in the first fume hood you see to your left when you walk in the door of the microfluidics lab, Elings 3430.
 ----
@@ Line 30: / Line 25: @@
 ----
 ===== Training Documentation =====
-{{ :vapor_silanation_rig_sop_2_.pdf |}}
+[[vapor_silanation_rig_sop|Vapor Silanization Rig Safe Operating Procedures]]
 ----
+===== Trimethylchlorosilane =====
+Synonyms:
+  * TMCS
+  * Trimethylchlorosilane
+  * Trimethylsilyl chloride
+Formula: C3H9ClSi
+Molecular weight: 108.64 g/mol
+CAS-No.: 75-77-4
+EC-No.: 200-900-5
+This protocol is intended for gas-phase monolayer deposition of a silane to serve as a counter-adhesion agent for glass or silicon substrates. The chemical trimethylchlorosilane will be referred to as silane for the purposes of this protocol. It can be deposited onto silicon and glass substrates and etch metal oxides (e.g. alumina).
+----
 ===== Reference Documentation =====
@@ Line 43: / Line 55: @@
 {{:tools:vaporsilanationrig:tmcs_msds.pdf|}}
-{{ ::changing_silane_container_sop.pdf |}}
 ----