exposure_system
Differences
This shows you the differences between two versions of the page.
| Both sides previous revisionPrevious revisionNext revision | Previous revision | ||
| exposure_system [2023/01/05 20:29] – haley | exposure_system [2024/09/26 20:04] (current) – epace | ||
|---|---|---|---|
| Line 4: | Line 4: | ||
| | {{ : | | {{ : | ||
| | **Tool Type: | | **Tool Type: | ||
| - | | **Location: | + | | **Location: |
| Line 14: | Line 14: | ||
| ===== About ===== | ===== About ===== | ||
| - | Small UV enclosure, primarily for curing of resins and resists. | + | Small UV enclosure, primarily for curing of resins and resists. Located in fume hood #3 in 3430. |
| ---- | ---- | ||
| Line 38: | Line 38: | ||
| {{: | {{: | ||
| - | |||
| - | ---- | ||
| - | |||
| - | ===== Reference Documentation ===== | ||
| - | |||
| - | |||
| ---- | ---- | ||
exposure_system.1672950586.txt.gz · Last modified: 2023/01/05 20:29 by haley
