Differences

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--- vapor_silanation_rig [2023/01/05 03:06] – [Vapor Silanation Rig] haley
+++ vapor_silanation_rig [2023/06/26 22:28] (current) – furst
@@ Line 1: / Line 1: @@
-====== Vapor Silanation Rig ======
+====== Vapor Silanization Rig ======
-^                               Vapor Silanation Rig                                   ^
+^                               Vapor Silanization Rig                                   ^
 |            {{:tools:vaporsilanationrig:img_5307.jpg?200|}}                   |
-| **Tool Type:**                  Vacuum deposition chamber                           |
+| **Tool Type:**                  Surface treatment                          |
 | **Location:**                   Microfluidics Lab                           |
-| **Description:**                Vapor Silanation Rig                           |
+| **Description:**                Vacuum deposition chamber                           |
-| **Manufacturer:**               "TEXT HERE"                           |
+| **Manufacturer:**               Fisher Scientific                           |
-Last Updated: 7/6/22 Haley
+Last Updated: 4/4/23 Haley
 ----
 ===== About =====
-The vapor silanation rig is located in the first fume hood you see to your left when you walk in the door of the microfluidics lab, Elings 3430.
+The vapor silanization rig is located in the first fume hood you see to your left when you walk in the door of the microfluidics lab, Elings 3430.
 ----
@@ Line 27: / Line 27: @@
 ===== Training Documentation =====
-{{ :vapor_silanation_rig_sop_2_.pdf |}}
+[[vapor_silanation_rig_sop|Vapor Silanization Rig Safe Operating Procedures]]
 ----
@@ Line 34: / Line 35: @@
 Synonyms:
-TMCS
+  * TMCS
-Trimethylchlorosilane
+  * Trimethylchlorosilane
-Trimethylsilyl chloride
+  * Trimethylsilyl chloride
 Formula: C3H9ClSi
-Molecular weight: 108.64 g/mol
-CAS-No.: 75-77-4
+Molecular weight: 108.64 g/mol
-EC-No.: 200-900-5
+CAS-No.: 75-77-4
+EC-No.: 200-900-5
 This protocol is intended for gas-phase monolayer deposition of a silane to serve as a counter-adhesion agent for glass or silicon substrates. The chemical trimethylchlorosilane will be referred to as silane for the purposes of this protocol. It can be deposited onto silicon and glass substrates and etch metal oxides (e.g. alumina).
@@ Line 50: / Line 55: @@
 {{:tools:vaporsilanationrig:tmcs_msds.pdf|}}
-{{ ::changing_silane_container_sop.pdf |}}
 ----